Chemical vapor deposition of fine grained rhenium on carbon base

Details Chemical vapor deposition of fine grained rhenium on carbon base Chemical vapor deposition of fine grained rhenium on carbon base

1995-03-22

1996-11-19

Jordan, Charles T.

Stock material or miscellaneous articles

All metal or with adjacent metals

Having metal particles

428544, 428546, 428548, 428549, 428551, 428570, 428634, 427249, 427252, 4272551, 427250, B22F 300

Patent

active

055772633

ABSTRACT:
A method for producing a composite element by causing a stream of gaseous rhenium hexafluoride to flow onto a carbon substrate in a chemical vapor deposition reaction. A flow of hydrogen gas causes a reduction of the rhenium hexafluoride to rhenium metal to thereby deposit a uniform layer of rhenium metal onto the surface of the carbon substrate. A fine grain rhenium coating on carbon is produced having an average particle diameter of from about 0.1 to about 25 micrometers. The elements may be used alone or several of them may be bonded together into various articles. Such elements and articles are useful as light weight, high temperature strength, corrosive gas resistant structural elements.

REFERENCES:
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patent: 5169685 (1992-12-01), Woodruff et al.
patent: 5209388 (1993-05-01), Mittendorf et al.
J. G. Donaldson, et al.; "A Preliminary Study of Vapor Deposition Of Rhenium and Rhenium-Tungsten", J. Less Common Metals, vol. 14, pp. 93-101, (1968).
Y. Isobe, et al., "Chemical Vapor Deposition Of Rhenium On Graphite", J. Less Common Metals, vol. 152, pp. 177-184 (1989).
Van Zant, Peter, Microchip Fabrication 2nd Ed., McGraw-Hill, pp. 308-310 Jan. 1990.

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