Chemical vapor deposition of dense and transparent zirconia film

Details Chemical vapor deposition of dense and transparent zirconia film Chemical vapor deposition of dense and transparent zirconia film

1990-02-09

1992-09-08

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

4272552, 427314, C23C 1608, C23C 1640

Patent

active

051457202

ABSTRACT:
A chemical vapor deposition method is disclosed for forming a dense and transparent or semitransparent zirconia film on a substrate which has substantially one or two kinds of particular planes such as (200), (111) or (111) planes only oriented in parallel to the surface of the substrate.

REFERENCES:
patent: 3365316 (1968-01-01), Kingery et al.
patent: 4810530 (1989-03-01), D'Angelo et al.
patent: 4844951 (1989-07-01), Sarin et al.
Wahl et al., Proc. 7th Int. Conf. on CVD-1979 (The Electrochemical Soc., Proc. vol. 79-3) pp. 536-545.
Powell et al., Vapor Deposition, (John Wiley, New York), c. 1966, pp. 398-401.
Bunshah et al., Deposition Technologies for Films & Coatings, (Noyes, Park Ridge, N.J.) c. 1982, pp. 335, 357-359.

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