Chemical vapor deposition of aluminum films using dimethylethyla

Details Chemical vapor deposition of aluminum films using dimethylethyla Chemical vapor deposition of aluminum films using dimethylethyla

1991-09-05

1993-03-02

Dees, Jose G.

Organic compounds -- part of the class 532-570 series

Organic compounds

Heavy metal containing

556176, C07F 506

Patent

active

051910993

ABSTRACT:
This invention provides essentially pure dimethylethylamine alane, which is useful for the chemical vapor deposition of thin films of aluminum.

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