Coating processes – Coating by vapor – gas – or smoke
Reexamination Certificate
2006-02-14
2006-02-14
Meeks, Timothy (Department: 1762)
Coating processes
Coating by vapor, gas, or smoke
C427S255230, C427S255280, C118S072000
Reexamination Certificate
active
06998152
ABSTRACT:
The present invention provides methods and apparatus for vaporizing and transporting precursor molecules to a process chamber for deposition of thin films on a substrate. The methods and apparatus include CVD solvents that comprise ionic liquids. The ionic liquids comprise salt compounds that have substantially no measurable vapor pressure (i.e., less than about 1 Torr at about room temperature), exhibit a wide liquid temperature range (i.e., greater than about 100° C.), and have low melting points (i.e., less than about 250° C.). A desired precursor is dissolved in a selected CVD solvent comprising an ionic liquid. The solvent and precursor solution is heated to or near the precursor volatilization temperature of the precursor. A stream of carrier gas is directed over or is bubbled through the solvent and precursor solution to distill and transport precursor molecules in the vapor phase to a deposition chamber. Conventional deposition processes may be used to deposit the desired thin film on a substrate.
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Klarquist & Sparkman, LLP
Markham Wesley
Meeks Timothy
Micro)n Technology, Inc.
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