Chemical vapor deposition methods of depositing zinc boro-silica

Details Chemical vapor deposition methods of depositing zinc boro-silica Chemical vapor deposition methods of depositing zinc boro-silica

1976-06-03

1978-08-08

Gwinnell, Harry J.

Coating processes

Coating by vapor, gas, or smoke

106 54, 118 48, 118 49, 357 73, 427 79, 427 80, 427 95, 427 99, 427255, C23C 1108

Patent

active

041058100

ABSTRACT:
An alkyl compound of zinc is reacted with alkyl compounds or alkoxyl compounds of boron and silicon in the presence of oxygen, thereby to deposit on a substrate zinc borosilicate glass film through a chemical vapor deposition process. The outlet nozzle of a raw material supply conduit for introducing the raw material compounds into a reaction zone is opened in the direction substantially in parallel with a surface of the substrate on which the glass film is to be deposited so that raw materials may be well mixed at the reaction zone. The glass film thus produced has a uniform thickness and a homogeneous composition of the constituents over an area at least of 40 mm extending from the nozzle and is suited for use as protection films for semiconductor devices and dielectric layer for a thin film capacitor on an industrial base.

REFERENCES:
patent: 3481781 (1969-12-01), Kern
patent: 3652331 (1972-03-01), Yamazaki
patent: 3681132 (1972-08-01), Pammer
patent: 3752701 (1973-08-01), Morrisey
patent: 3828722 (1974-08-01), Reuter et al.
patent: 3850687 (1974-11-01), Kern
patent: 3900330 (1975-08-01), Moriguchi et al.
Powell et al., Vapor Deposition, pp. 401, 402 (1966).
Viva, IBM Tech. Dis. Bull., vol. 14, No. 9, p. 2550 (Feb. 1972).
Kern et al., J. Electrochem. Soc., vol. 117, No. 4, pp. 562-573 (1970).

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