Chemical vapor deposition method of producing fluorine-doped tin

Details Chemical vapor deposition method of producing fluorine-doped tin Chemical vapor deposition method of producing fluorine-doped tin

1985-11-12

1987-09-29

Childs, Sadie L.

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

65 6052, 427109, 427166, 427255, C23C 1640

Patent

active

046968377

ABSTRACT:
In accordance with the invention, there is provided herein an improved chemical vapor deposition method for forming fluorine-doped tin oxide coatings using a liquid coating composition which includes a reactive organic fluorine dopant and an organotin compound. The method is carried out under a defined set of process conditions such that the coating produced has a minimum and constant sheet resistance which is substantially independent of deposition temperature.

REFERENCES:
patent: 4146657 (1979-03-01), Gordon
patent: 4293594 (1981-10-01), Yuldas et al.
patent: 4419386 (1983-12-01), Gordon
patent: 4476158 (1984-10-01), Baumberger et al.
patent: 4500567 (1985-02-01), Kato et al.
patent: 4590096 (1986-05-01), Lindner

Affiliated with

Also associated with

Rating

Chemical vapor deposition method of producing fluorine-doped tin does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical vapor deposition method of producing fluorine-doped tin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical vapor deposition method of producing fluorine-doped tin will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1588687