Chemical vapor deposition method for forming a deposited film wi

Details Chemical vapor deposition method for forming a deposited film wi Chemical vapor deposition method for forming a deposited film wi

1994-11-14

1996-08-20

Lusignan, Michael

Coating processes

Coating by vapor, gas, or smoke

427250, 427252, 4272551, 4272552, 4272553, C23C 1600

Patent

active

055477089

ABSTRACT:
A chemical vapor deposition method for forming a deposited film on a substrate using a film-forming liquid raw material. The film-forming liquid is pulverized into liquid fine particles which are heated together with a gas to produce a film-forming raw material gas. The film-forming raw material gas is introduced into a reaction chamber where it chemically reacts with a surface of a substrate which is present in the reaction chamber.

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