Chemical vapor deposition method and system for...

Details Chemical vapor deposition method and system for... Chemical vapor deposition method and system for...

2008-08-08

2011-12-06

Gambetta, Kelly M (Department: 1715)

Coating processes

Coating by vapor, gas, or smoke

C427S255230

Reexamination Certificate

active

08071165

ABSTRACT:
A method of and system for chemical vapor deposition of layers of material on substrates for producing semiconductor devices provides for continuous in-line processing. The method includes continuously conveying a plurality of substrates through a plurality of in-line deposition regions, continuously providing and distributing a chemical vapor at each region to deposit material for the layer, and continuously supplying a flow of chemical material for each region to provide the chemical vapor. The system includes a continuous in-line substrate conveyance apparatus for moving a plurality of substrates through a plurality of deposition regions, a deposition head for providing and distributing a chemical vapor at each of the regions to deposit material for the layers, and a chemical material supply apparatus for providing a flow of chemical materials to each of the heads for the chemical vapor.

REFERENCES:
patent: 6974976 (2005-12-01), Hollars
patent: 2009/0203194 (2009-08-01), Tanaka
patent: 1168420 (2002-01-01), None
patent: 1860685 (2007-11-01), None
patent: 2006123870 (2006-11-01), None

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