Chemical vapor deposition method, and chemical vapor deposition

Coating apparatus – Gas or vapor deposition – With treating means

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118715, 118733, C23C 1600

Patent

active

053383630

ABSTRACT:
In order to prevent deposition of a reaction byproduct on the peripheries of reaction gas introduction holes, an annular inert gas injection member having a number of inert gas injection holes is provided around the reaction gas introduction holes. An inert gas is injected from inert gas injection holes toward an exhaust passage. This inert gas promotes a flow of an exhaust gas from a reaction space and forcibly flows toward the exhaust passage. Thus, a reaction byproduct contained in the exhaust gas is not remarkably deposited in the vicinity of the peripheries of the reaction gas introduction holes but quickly discharged into the exhaust passage. Thus, the reaction byproduct is hardly deposited around the reaction gas introduction holes.

REFERENCES:
patent: 5000113 (1991-03-01), Wang
Lueger (Technological Encyclopedia), 4th ed., vol. 16, p. 488, "Lexikon Der Technik", K. Schiefer.

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