Chemical vapor deposition method and apparatus making use of liq

Details Chemical vapor deposition method and apparatus making use of liq Chemical vapor deposition method and apparatus making use of liq

1992-12-22

1995-09-05

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

118724, 427576, 437187, H01L 2120

Patent

active

054475686

ABSTRACT:
A starting gas feeding apparatus for forming a gaseous starting material from a liquid starting material and feeding the gaseous starting material into a reaction chamber of a CVD apparatus, comprises; a container that holds the liquid starting material, pressure reducing means for reducing the pressure inside the container, and heating means for heating the liquid starting material held in the container; the liquid starting material being boiled.

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patent: 4625678 (1986-12-01), Shioya et al.
patent: 4717596 (1988-01-01), Barbee et al.
patent: 5091210 (1992-02-01), Mikoshiba et al.
patent: 5154949 (1992-10-01), Shindo et al.
patent: 5179042 (1993-01-01), Mikoshiba et al.
patent: 5180687 (1993-01-01), Mikoshiba et al.

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