Chemical vapor deposition material and chemical vapor...

Details Chemical vapor deposition material and chemical vapor... Chemical vapor deposition material and chemical vapor...

2006-02-21

2006-02-21

Nazario-Gonzalez, Porfirio (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Heavy metal containing

C427S250000, C427S255190

Reexamination Certificate

active

07002033

ABSTRACT:
A chemical vapor deposition material comprising a ruthenium compound having a ligand represented by the following formula:wherein R1, R2and R3are each independently a hydrogen atom, fluorine atom, trifluoromethyl group or hydrocarbon group having 1 to 10 carbon atoms,and a method of forming a ruthenium film from the chemical vapor deposition material by chemical vapor deposition.A high-quality ruthenium film even when it is very thin can be obtained.

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