Chemical vapor deposition (CVD) process for the thermally deposi

Details Chemical vapor deposition (CVD) process for the thermally deposi Chemical vapor deposition (CVD) process for the thermally deposi

1990-07-13

1991-10-01

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

Carbon or carbide coating

C23C 1632

Patent

active

050532553

ABSTRACT:
A thermal CVD process for forming silicon carbide-type films onto a substrate comprising the steps of:

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D. Cagliostro et al., "Analysis of the Pyrolysis Products of Dimethyldichlorosilane in the Chemical Vapor Deposition of Silicon Carbide in Argon", J. Am. Ceram. Soc. 73 (1990).
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Richard D. Veltri et al., "Chemical Vapor Deposited SiC Matrix Composites", J. Am. Caram. Soc., 72 (1989).
A. Mestari et al., "Evidence for Free Caron in Amorphous OMCVD Silicon-Rich Si.sub.x C.sub.1-x Coatings", Journal de Physique, vol. 50, May, 1989.
F. Langlais et al., "On The Kinetics of the CVD of Si from SiH.sub.2 Cl.sub.2 H.sub.2 and SiC from CH.sub.3 SiCl.sub.3 /H.sub.2 in a Vertical Tubular Hot-Wall Reactor", Journal de Physique, vol. 50, May, 1989, pp. 93-103.
S. Patai et al., "The Chemistry of Organic Silicon Compounds", John Wiley & Sons (1989), pp. 1233-1234.
R. Brutsch, "Chemical Vapour Deposition of Silicon Carbide an its Applications", Thin Solid Films 126 (1985), pp. 313-318.
Y. G. Roman et al., "Silicon Carbide Chemical Vapour Infiltration", Journal de Physique, vol. 50, May, 1989.

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