Chemical vapor deposition chamber pre-deposition treatment...

Details Chemical vapor deposition chamber pre-deposition treatment... Chemical vapor deposition chamber pre-deposition treatment...

2006-10-24

2006-10-24

Chen, Bret (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

C427S533000, C427S579000, C134S001100, C134S022100, C438S905000

Reexamination Certificate

active

07125583

ABSTRACT:
A method for improving thickness uniformity and throughput of a carbon doped oxide deposition process is described. That method comprises removing pre-deposition steps in a deposition phase. Moreover, helium plasma is added to a pre-clean phase to eliminate the production of dummy wafers.

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Andideh, et al., “Concentration Graded Carbon Doped Oxide,” U.S. Appl. No. 09/943,874 filed Aug. 31, 2001. under Final Rejection.

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