Chemical vapor deposition apparatus for obtaining high quality e

Details Chemical vapor deposition apparatus for obtaining high quality e Chemical vapor deposition apparatus for obtaining high quality e

1988-09-22

1991-02-12

Andrews, Melvyn J.

Coating processes

Electrical product produced

Welding electrode

156611, 156613, 118730, 118724, 437 81, 148DIG6, C23C 1600

Patent

active

049923013

ABSTRACT:
A chemical vapor deposition apparatus includes a reaction tube, a substrate-holder installed in the reaction tube, the substrate-holder holding a plurality of substrates in a vertical direction, surfaces of the substrates being held horizontally, a rotating-means for rotating the substrate-holder, a heating-means for heating the substrates, a first gas-supply nozzle tube installed vertically in the reaction tube, the first gas-supply nozzle tube having a first vertical gas-emission line of a plurality of first gas-emission holes aligned in a vertical direction, and a second gas-supply nozzle tube installed vertically in the reaction tube, the second gas-supply nozzle tube having a second vertical gas-emission line, a plurality of second gas-emission holes aligned in a vertical direction, a first gas-emitting-axis of the first gas-emission holes intersecting with a second gas-emitting-axis of the second gas-emission holes at a first intersection over the substrate, the first intersection of the first and second gas-emitting axes being deviated from the rotation center of the substrate-holder.

REFERENCES:
patent: 4745088 (1988-05-01), Inoue et al.
Ban et al, Proceedings of the Seventh International Conference on Chemical Vapor Deposition pp. 102-125 (1979).
Ban, Journal of Crystal Growth pp. 97-107 (1978).

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