Chemical vapor deposition apparatus and method

Details Chemical vapor deposition apparatus and method Chemical vapor deposition apparatus and method

2005-06-28

2005-06-28

Meeks, Timothy (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

C427S252000, C427S253000

Reexamination Certificate

active

06911234

ABSTRACT:
Chemical vapor deposition apparatus and method are provided with coating gas distribution and exhaust systems that provide more uniform coating gas temperature and coating gas flow distribution among a plurality of distinct coating zones disposed along the length of a coating chamber.

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U.S. Appl. No. 09/950,012, filed Sep. 2001.

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