Chemical vapor deposition apparatus

Details Chemical vapor deposition apparatus Chemical vapor deposition apparatus

1995-06-07

1998-09-08

Niebling, John

Coating apparatus

Gas or vapor deposition

With treating means

118722, 118723IR, C23C 1600

Patent

active

058039740

ABSTRACT:
A process for forming a deposited film on a substrate according to the chemical vapor deposition method comprises previously forming excited species of a gas phase compound containing atoms which become constituents constituting said deposited film, supplying the excited species onto the surface of said substrate and effecting photoirradiation on said substrate surface, thereby forming the deposited film through the surface reaction.

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