Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Patent
1996-07-05
1998-07-07
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Crucible or evaporator structure
261124, 261DIG65, C23C 1600
Patent
active
057762554
ABSTRACT:
A chemical vapor deposition apparatus comprises a starting material container holding a starting material in a liquid state, a starting gas generating container into which the liquid starting material is fed from the starting material container, a means for keeping constant the liquid level of the liquid starting material held in the starting gas generating container, a means for injecting a bubbling gas from the outside into the liquid starting material held in the starting gas generating container, thereby bubbling the starting gas, and a reaction chamber into which a mixed gas of the starting gas and the bubbling gas are fed.
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Asaba Tetsuo
Hayakawa Yukihiro
Kawasumi Yasushi
Ohmi Kazuaki
Sekine Yasuhiro
Bueker Richard
Canon Kabushiki Kaisha
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