Coating apparatus – With indicating – testing – inspecting – or measuring means
Patent
2000-01-06
2000-08-01
Bueker, Richard
Coating apparatus
With indicating, testing, inspecting, or measuring means
118708, 118724, 118726, C23C 1600
Patent
active
060961333
ABSTRACT:
An apparatus for depositing a thin film on a substrate by chemical vapor deposition (CVD) includes a material container for containing a liquid CVD source material; a material feeder for feeding the liquid CVD source material from the material container to a vaporizer while keeping the CVD source material liquid; a vaporizer for vaporizing the liquid CVD source material fed from the material feeder by heating the liquid CVD source material to a high temperature to form a CVD source material gas; a reaction chamber connected to the vaporizer by a pipe for forming a thin film on a substrate using the CVD source material gas; and a thermostatic box surrounding the reaction chamber, wherein both of the vaporizer and piping connecting the vaporizer to the reaction chamber are located within the thermostatic box.
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Kawahara et al., "Step Coverage and Electrical Properties Of (Ba, Sr) TiO.sub.3 Films Prepared by Liquid Source Chemical Vapor Deposition Using TiO(DPM).sub.2 ", Japanese Journal of Applied Physics, vol. 33, Part 1, No. 9B, 1994, pp. 5129-5134.
Kawahara et al., "Influence Of Ti Sources On Properties Of *Ba, Sr)TiO.sub.3 Films Prepared by Liquid Source CVD", Materials Research Society Symposium, vol. 361, 1995, pp. 361-368.
Kawahara Takaaki
Makita Tetsuro
Okudaira Tomonori
Ono Koichi
Yamamuka Mikio
Bueker Richard
Mitsubishi Denki & Kabushiki Kaisha
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