Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate
2008-05-06
2008-05-06
Hassanzadeh, Parviz (Department: 1792)
Coating apparatus
Gas or vapor deposition
Work support
C156S345550
Reexamination Certificate
active
07368018
ABSTRACT:
A chemical vapor deposition apparatus is provided. The chemical vapor deposition apparatus includes a susceptor support base and a susceptor, and configured to rotate the susceptor with a rotary shaft, a gap as wide as about 1 mm or more is provided along the boundary between the support base and the perimeter of the susceptor to prevent Ga from forming bridges between the support base and the susceptor during growth of III-V compound semiconductors such as GaN, thereby preventing disturbance of rotation.
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Bell Boyd & Lloyd LLP
Dhingra Rakesh K
Hassanzadeh Parviz
Powdec K.K.
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