Chemical vapor deposition and powder formation using thermal spr

Details Chemical vapor deposition and powder formation using thermal spr Chemical vapor deposition and powder formation using thermal spr

1996-08-02

1999-12-07

Bareford, Katherine A.

Coating processes

Spray coating utilizing flame or plasma heat

Inorganic carbon containing coating, not as steel

427576, 427577, 427249, 427250, 4272551, 264 5, 264 7, C23C 1644

Patent

active

059979569

ABSTRACT:
A method for chemical vapor deposition using a very fine atomization or vaporization of a reagent containing liquid or liquid-like fluid near its supercritical temperature, where the resulting atomized or vaporized solution is entered into a flame or a plasma torch, and a powder is formed or a coating is deposited onto a substrate. The combustion flame can be stable from 10 torr to multiple atmospheres, and provides the energetic environment in which the reagent contained within the fluid can be reacted to form the desired powder or coating material on a substrate. The plasma torch likewise produces the required energy environment, but, unlike the flame, no oxidizer is needed so materials stable in only very low oxygen partial pressures can be formed. Using either the plasma torch or the combustion plasma, coatings can be deposited and powders formed in the open atmosphere without the necessity of a reaction chamber, but a chamber may be used for various reasons including process separation from the environment and pressure regulation.

REFERENCES:
patent: 4582731 (1986-04-01), Smith
patent: 4734227 (1988-03-01), Smith
patent: 4734451 (1988-03-01), Smith
patent: 4970093 (1990-11-01), Sievers et al.
patent: 5032568 (1991-07-01), Lau et al.
patent: 5213851 (1993-05-01), Snyder et al.
Hunt et al., Combustion chemical vapor deposition: A novel thin-film deposition technique, Appl. Phys. Lett. 63:266-268 (1993) (no month date).
Ichinose et al., Synthesis of BaTiO.sub.3 /LaNiO.sub.3 and PbTiO.sub.3 /LaNiO.sub.3 Multilayer Thin Films by Spray Combustion Flame Technique, Jpn. J. Appl. Phys. 33:5903-5906 (1994) (no month date).
Ichinose et al., Deposition of LaMO.sub.3 (M=Ni, Co, Cr, Al)-Oriented Films by Spray Combustion Flame Technique, Jpn. J. Appl. Phys. 33:5907-5910 (1994) (no month date).
Hansen et al., Supercritical Fluid Transport-Chemical Deposition of Films, Chem. Mater. 4:749-752 (1992) (no month date).
Hybertson et al., Deposition of Palladium Films by a Novel Supercritical Fluid Transport-Chemical Deposition Process, Mat. Res. Bull. 26:1127-1133 (1991) (no month date).
Koguchi et al., Preparation of Yba.sub.2 Cu.sub.3 O.sub.X Thin Film by Flame Pyrolysis, Jap. J. Appl. Phys 29:L33-L35 (1990) (no month date).
Suzuki et al., Superconducting thin films of Bi-Pb-Sr-Ca-Cu-O synthesized by the spray-inductively coupled plasma technique, J. Materials Science 26:5929-5932 (1991) (no month date).
Suzuki et al., Thin Films of Chromium Oxide Compounds Formed by the Spray-ICP Technique, J. Crystal Growth 99:611-615 (1990) (no month date).
Suzuki et al., Thin films of rare-earth (Y, La, Ce, Pr, Nd, Sm) oxides formed by the spray-ICP technique, J. of Crystal Growth 112:621-627 (1991) (no month date).
T. R. Smith and M. Bonner Denton, Evaluation of Current Nebulizers and Nebulizer Characterization Techniques, Applied Spectroscopy 44:21-24 (1990) (no month date).
J. W. Tom and P. G. Debenedetti, Particle formation with supercritical fluids--a review, J. Aerosol Sci. 22:555-584 (1991) (no month date).
Matson et al., Rapid Expansion of Supercritical Fluid Solutions: Solute Formation of Powders, Thin Films, and Fibers, Ind. Eng. Chem. Res. 26:2298-2306 (1987) (no month date).
Merkle et al., Superconducting Yba.sub.2 Cu.sub.3 O.sub.x Particulate Produced by Total Consumption Burner Processing, Materials Science and Engineering A124:31-38 (1990) (no month date).
McHale et al., Preparation of High-T.sub.c Oxide Films via Flaming Solvent Spray, J. of Superconductivity 5:511-518 (1992) (no month date).
Thermal Spraying: Practice, Theory, and Application, American Welding Society, Miami, Fl., 1985, pp. 6-12 (no month date).

Affiliated with

Also associated with

Rating

Chemical vapor deposition and powder formation using thermal spr does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical vapor deposition and powder formation using thermal spr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical vapor deposition and powder formation using thermal spr will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-821141