Chemical vapor deposition

Details Chemical vapor deposition Chemical vapor deposition

1977-12-27

1981-02-10

Kaplan, Morris

Coating processes

Coating by vapor, gas, or smoke

Metal coating

427255, 427294, C23C 1102

Patent

active

042502101

ABSTRACT:
A process for chemical vapor deposition of ruthenium on heat resistant substrates employing ruthenium 1, 3 dione compounds as volatile sources and causing the volatile material to impact on a heated receiving substrate in random fashion in a quiescent, low-pressure atmosphere.

REFERENCES:
patent: 3071493 (1963-01-01), Whaley et al.
patent: 3259678 (1966-07-01), Davis
patent: 3294654 (1966-12-01), Norman et al.
patent: 3356527 (1967-12-01), Moshier et al.

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