Coating apparatus – Gas or vapor deposition – With treating means
Patent
1993-05-03
1994-07-12
Hearn, Brian E.
Coating apparatus
Gas or vapor deposition
With treating means
118719, 118715, 156345, H01L 2100, C23C 1600
Patent
active
053285158
ABSTRACT:
The apparatus incorporates a h.f. source (2), a plasma enclosure ( 4 ) having gas supplies, a vacuum pump (50), elements for coupling the source to the plasma enclosure, which is of a non-radiating type and which is shaped like a rectangular parallelepiped with first and second dielectric material faces parallel to the direction of the magnetic field and a third face having a rectangular opening (14) parallel to said field for forming a ribbon-like plasma, a treatment enclosure containing a mobile sample holder (18) communicating via the opening with the plasma enclosure. The coupling means have two linear waveguides (30, 38 ) with a rectangular cross-section oriented in the wave propagation direction and located on either side of the plasma enclosure, a horn (36) for coupling one of the guides to the plasma enclosure, whose cross-section widens in the magnetic field direction, the other guide being provided with a short-circuit (46).
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M. Geisler et al., J. Vac. Sci. Technol., A8 (2), Mar./Apr. 1990, pp. 908-915, "Elongated Microwave Electron Cyclotron Resonance Heating Plasma Source" French Search Report, FR 9205629, FA 473921.
Chouan Yannick
Contellec Michel Le
Morin Francois
Saada Serge
Baskin Jonathan D.
France Telecom Etablissement (Autonome de Droit Public)
Hearn Brian E.
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