Chemical supply system

Cleaning and liquid contact with solids – Apparatus – With plural means for supplying or applying different fluids...

Reexamination Certificate

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C134S100100

Reexamination Certificate

active

10849836

ABSTRACT:
A chemical supply system comprises, as principal elements, a chemical storage tank in which a liquid chemical for cleaning is stored in the state of its formulated concentrate, a chemical supply apparatus connected to the chemical storage tank for positively performing chemical supply, a piping system connected to the chemical supply apparatus to form a supply flow passage that is a passage for ultrapure water which the liquid chemical is to be mixed with, a pair of discharge nozzles disposed at end portions of the piping system so as to oppose surfaces of a wafer set in a cleaning chamber to supply a cleaning liquid onto the surfaces. Thereby, remarkable miniaturization/simplification of a cleaning liquid supply system including chemical tanks is intended, it is made possible easily and rapidly to compound and supply a cleaning liquid at an accurate chemical concentration, and particles or the like being generated and mixing in a cleaning liquid, are suppressed to the extremity.

REFERENCES:
patent: 4133773 (1979-01-01), Simmons
patent: 4254805 (1981-03-01), Reeder
patent: 4664528 (1987-05-01), Rodgers et al.
patent: 4964732 (1990-10-01), Cadeo et al.
patent: 5873946 (1999-02-01), Hantmann
patent: 6132078 (2000-10-01), Lin
patent: 6764212 (2004-07-01), Nitta et al.

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