Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Reexamination Certificate
2011-01-04
2011-01-04
Webb, Gregory E (Department: 1796)
Semiconductor device manufacturing: process
Chemical etching
Combined with the removal of material by nonchemical means
Reexamination Certificate
active
07863195
ABSTRACT:
An apparatus for feeding slurry to an external device. The apparatus includes a preparation tank for preparing the slurry. A circulation pipe is connected to the preparation tank to circulate the slurry. A feeding pipe is connected between the preparation tank and the external device to feed the external device with the slurry. A pump sends the chemical solution in the preparation tank to the circulation pipe and the feeding pipe. A concentration detector is arranged downstream to the pump to detect the concentration of the slurry. A controller controls the concentration of the chemical solution in the preparation tank in accordance with the detection value of the concentration detector and controls the feeding of the chemical solution.
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Hiraoka Naoki
Osuda Hiroshi
Yamamoto Hotaka
Fujitsu Semiconductor Limited
Kratz Quintos & Hanson, LLP
Webb Gregory E
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