Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1997-07-22
1999-08-31
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
4302701, 430905, 430920, G03F 7039, G03C 152
Patent
active
059452480
ABSTRACT:
Proposed is a positive-working chemical-sensitization photoresist composition having advantages in respect of high resolution of patterning, high photosensitivity and orthogonal cross sectional profile of the patterned resist layer as well as in respect of little dependency of the performance on the nature of the substrate surface. The composition comprises:
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patent: 5338641 (1994-08-01), Pawlowski et al.
patent: 5350660 (1994-09-01), Urano et al.
patent: 5424166 (1995-06-01), Pawlowski et al.
Nakayama Toshimasa
Nitta Kazuyuki
Sakai Yoshika
Sato Kazufumi
Yamazaki Akiyoshi
Chu John S.
Tokyo Ohka Kogyo Co. Ltd.
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