Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1996-06-07
1999-01-05
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, G03F 7023
Patent
active
058560580
ABSTRACT:
Proposed is a novel chemical sensitization-type positive-working photoresist composition used for the photolithographic patterning works in the manufacture of semiconductor devices exhibiting an excellent halation-preventing effect in the patternwise exposure to light. The composition comprises, in addition to conventional ingredients including an acid-generating agent capable of releasing an acid by the irradiation with actinic rays and a resinous ingredient capable of being imparted with increased solubility in an aqueous alkaline developer solution in the presence of an acid, a unique halation inhibitor which is an esterification product between a specified phenolic compound and a naphthoquinone-1,2-diazide sulfonic acid.
REFERENCES:
patent: 5403695 (1995-04-01), Hayase et al.
patent: 5525453 (1996-06-01), Przybilla et al.
Nakayama Toshimasa
Nitta Kazuyuki
Sakai Yoshika
Sato Kazufumi
Yamazaki Akiyoshi
Tokyo Ohka Kogyo Co. Ltd.
Young Christopher G.
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