Chemical purification for semiconductor processing by partial co

Details Chemical purification for semiconductor processing by partial co Chemical purification for semiconductor processing by partial co

1993-08-31

1995-06-27

Kilner, Christopher B.

Refrigeration

Processes

Circulating external gas

62 16, 62 17, 423240R, 423488, F25J 300, C01B 707

Patent

active

054269440

ABSTRACT:
A purification method and apparatus for creating ultra-purity chemicals for semiconductor processing. The purification method includes a step of expanding an ESG chemical through an orifice (17) inside a condenser (21) to a partial condensed state for removing impurities from ESG chemical. During the expansion step, the higher boiling point impurities remain in the liquid phase and the impurities in the vapor phase are removed at least in part by a scavenging technique. After purification, the ultra-purified gas is transferred to a semiconductor manufacturing operation (24). The manufacturing operation includes both dry and wet processes. The method may also be integrated into a large volume on-site purification system (30), on-line point of use purifier (50), or small volume trans-filling purification system (70).

REFERENCES:
patent: 862906 (1908-06-01), Hasenbach
patent: 2389457 (1945-11-01), Pines et al.
patent: 2426914 (1947-09-01), Allen
patent: 2463188 (1949-03-01), Latehum, Jr.
patent: 2695875 (1954-11-01), McGarvey
patent: 3260059 (1966-07-01), Rosenberg et al.
patent: 3707066 (1972-12-01), Carne et al.
patent: 4623369 (1986-11-01), Yamazaki
patent: 4892625 (1990-01-01), Shimizu et al.
patent: 4964278 (1990-10-01), Wen et al.
patent: 4975259 (1990-12-01), Hyakutake et al.
patent: 4980144 (1990-12-01), Koto et al.
patent: 5027642 (1991-07-01), Wen et al.
Control of Cold Trap--by Monitoring Pressure discharging Non-Condensable Gases and Maintaining Pressure at Set Value, (Abstract No. J49117365, WPI/Derwent).
LN.sub.2 Piping Systems and Semiconductor Quality and Yield (400 Solid-State Technology, vol. 25 91982) Jul., No. 7, Port Washington, N.Y.).

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