Chemical processing system for maintaining concentration of semi

Gas separation: processes – With control responsive to sensed condition – Concentration sensed

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

95273, 134902, B01D 4646

Patent

active

054377102

ABSTRACT:
A chemical processing system for generating ultra-pure chemicals near the site of use. The system includes in series a supply of chemical or the site of use which may be a tank or drum and may be a point of use for semiconductor manufacturing, a concentrate sensor, a pump, a filter, a reactor vessel, and an optional heat exchanger, all connected by Kel-F tubing. Sources of pure filtered gas connect to the reactor vessel. An ozone generator can likewise connect to the reactor vessel. An optional isolation coil can likewise connect between the gas source and the reactor vessel.

REFERENCES:
patent: 3964957 (1976-06-01), Walsh
patent: 4855023 (1989-08-01), Clark et al.
patent: 4917123 (1990-04-01), McConnell et al.
patent: 4917136 (1990-04-01), Ohmi et al.
patent: 4936877 (1990-06-01), Hultquist et al.
patent: 5032218 (1991-07-01), Dobson
patent: 5073268 (1991-12-01), Saito et al.
patent: 5164049 (1992-11-01), Clark et al.
patent: 5174855 (1992-12-01), Tanaka
patent: 5242468 (1993-09-01), Clark et al.
Article in Dec. 1952 Issue of "Modern Plastics", vol. 30, #4, Fluorocarbons-Face, Fame and Fortune, Author Unknown.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Chemical processing system for maintaining concentration of semi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical processing system for maintaining concentration of semi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical processing system for maintaining concentration of semi will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-731636

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.