Chemical processing system and method

Details Chemical processing system and method Chemical processing system and method

2005-09-23

2008-12-09

Kackar, Ram N. (Department: 1792)

Coating apparatus

Gas or vapor deposition

C156S345330, C156S345340

Reexamination Certificate

active

07462243

ABSTRACT:
A chemical processing system includes a processing chamber containing a chemical processing region and a gas injection system. The gas injection system includes at least one first gas injection orifice and at least one second gas injection orifice in communication with the chemical processing region to expose a substrate to mixed first and second process gases. Other embodiments of the chemical processing system can include a sensor to sense a mixing rate of the process gases or a shroud defining a portion of the at least one first gas injection orifice to control mixing of the process gases. A method of mixing process gas in a chemical processing region of a chemical processing system is provided in which a first process gas and a second process gas are injected into the chemical processing region and mixed. A mixture rate is sensed and used to control the mixing.

REFERENCES:
patent: 6070551 (2000-06-01), Li et al.
patent: 6086677 (2000-07-01), Umotoy et al.
patent: 6148761 (2000-11-01), Majewski et al.
patent: 6302964 (2001-10-01), Umotoy et al.
patent: 2002/0062790 (2002-05-01), Ikeda et al.
patent: 2003/0054099 (2003-03-01), Jurgensen et al.
patent: 2003/0094238 (2003-05-01), Strang et al.
patent: 0 550 058 (1993-07-01), None
patent: WO 98/00576 (1998-01-01), None
patent: WO 00/41212 (2000-07-01), None
Gary S. Selwyn, “Optical Diagnostic Techniques for Plasma Processing”, AVS Monograph Series, Education Committee of American Vacuum Society (New York), M-11, pp. 81-109, (1993).

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