Chemical process

Details Chemical process Chemical process

1996-07-18

1998-04-28

Siegel, Alan

Organic compounds -- part of the class 532-570 series

Organic compounds

Halogen containing

570165, 570167, 570168, 570169, C07C 1708, C07C 1700

Patent

active

057446580

ABSTRACT:
A method of producing 1,1,1,2-tetrafluoroethane in two separation reaction zones involving (1) reaction of trichloroethylene and hydrogen fluoride to produce l,l,l-trifluoro-2-chloroethane and (2) reaction of the 1,1,1-trifluoro-2-chloroethane and hydrogen fluoride to produce 1,1,1,2-tetrafluoroethane wherein both reactions are carried out at superatmospheric pressure, reaction (2) is carried out at a temperature in the range of 250.degree.-450.degree. C., reaction (1) is carried out at a temperature in the range of 200.degree.-400.degree. C. but below that used in reaction (2) and unconverted 1,1,1-trifluoro-2-chloroethane is recycled for further reaction with hydrogen fluoride.

REFERENCES:
patent: 2005710 (1935-06-01), Daudt et al.
patent: 2637747 (1953-05-01), McBee
patent: 4158675 (1979-06-01), Potter
patent: 4605798 (1986-08-01), Abel et al.
patent: 4922037 (1990-05-01), Manzer
patent: 5157172 (1992-10-01), Wanzke et al.
patent: 5243105 (1993-09-01), Scott et al.
patent: 5243107 (1993-09-01), Scott et al.
patent: 5334786 (1994-08-01), Koyama et al.
patent: 5382722 (1995-01-01), Scott et al.
patent: 5395996 (1995-03-01), Scott et al.
patent: 5444171 (1995-08-01), Ohno et al.

Affiliated with

Also associated with

Rating

Chemical process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1533335