Chemical process

Details Chemical process Chemical process

1996-07-11

1998-03-17

Ambrose, Michael G.

Organic compounds -- part of the class 532-570 series

Organic compounds

Heavy metal containing

558 84, 558155, 558157, 564 12, C07F 936, C07F 944, C07F 96574, C07F 96578

Patent

active

057288534

ABSTRACT:
A process for extracting metal values, especially zinc values, from aqueous solutions of metal salts, which comprises contacting the aqueous solution with an organic phase comprising a compound of the formula, ##STR1## wherein each of R.sup.1, R.sup.2, R.sup.3 and R.sup.4, independently, represents an optionally substituted hydrocarbyl or hydrocarbyloxy group or R.sup.1 and R.sup.2 together with the attached phosphorus atom and/or R.sup.3 and R.sup.4 together with the attached phosphorus atom from a 5- to 8-membered heterocyclic ring.

REFERENCES:
patent: 2798086 (1957-07-01), Coover, Jr. et al.
patent: 4721605 (1988-01-01), Brown et al.
patent: 4721606 (1988-01-01), Tilley
O. Navratil et al., Darstellung von Tetraphenylestern der Imidothio-und. . . . Z. Chem.. vol. 24 No. 1, 1984 p. 30.
J. Boedeker. Zur Lage Der P=S Valenzchwingung und. . . . J. Organometal. Chem.. vol. 56, 1973, pp. 255-260.
Chemical Abstracts, vol 116, 1992, & ZH. Obshch. Khim. vol. 61, No. 6, 1991, pp. 1474-1475, N. G. Zabirov et al., & Registry (Database, STN) RN: 13819-79-6, 138319-80-9, 13819-81-0, 13819-82-1.
A. Schmidpeter et al., Chem. Ber. vol. 101, 1968, pp. 815-823.
Nouaman et al., Zeitschrift fur Anorganische und Allgemeine Chemie, 619, 1147-1153 (1993).
Navratil et al., Collection of Czechoslovak Chemical Communications, 55 (a), 364-371 (1990).

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