Chemical modification of spin-on glass for improved performance

Details Chemical modification of spin-on glass for improved performance Chemical modification of spin-on glass for improved performance

1989-03-08

1989-12-05

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437228, 437240, 437248, 437982, H01L 21265

Patent

active

048852627

ABSTRACT:
A process for chemically modifying spin-on-glass (SOG) for improved performance in semiconductor device fabrication is disclosed. To compensate for severe surface topographies associated with very large scale integration (VLSI) technology, a thicker non-etch back SOG process is utilized for forming a SOG layer over a chemical vapor deposition (CVD) layer. A single layer of SOG is formed over the CVD layer, providing planarizing coverage over formational or growth defects. The silylation of the SOG layer provides for the formation thicker single layers of SOG and significantly reduces the wet etching rate in diluted HF.

REFERENCES:
patent: 4753866 (1988-06-01), Welch
patent: 4780394 (1988-10-01), Blanchard
patent: 4818335 (1989-04-01), Karneft
patent: 4824767 (1989-04-01), Chambers

Affiliated with

Also associated with

Rating

Chemical modification of spin-on glass for improved performance does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical modification of spin-on glass for improved performance , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical modification of spin-on glass for improved performance will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2034293