Chemical metallization process with radiation sensitive chromium

Radiation imagery chemistry: process – composition – or product th – Post imaging processing – Physical developing

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430275, 430279, 430311, 430315, 430413, 430495, 427304, 427305, 556 62, G03C 524, G03C 522

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046185682

ABSTRACT:
The present invention relates to a chemical metallization process, particularly for the spatially selective metallization of electrically insulating surfaces. This process employs a chemically stable, radiation sensitive sensitizer layer which contains chromium complex compounds and noble metal ions.

REFERENCES:
patent: 3650747 (1972-03-01), Colligaris et al.
patent: 3656952 (1972-04-01), Miller
patent: 3658534 (1972-04-01), Ishitani et al.
patent: 3671274 (1972-06-01), Maekawa et al.
patent: 3700448 (1972-10-01), Hillson et al.
patent: 3719490 (1973-03-01), Yudelson et al.
patent: 3942983 (1976-03-01), DiBlas et al.
patent: 3993802 (1976-11-01), Polichette et al.
patent: 4084023 (1978-04-01), Dafter
Sawyer, D. T. et al., JACS, vol. 85, p. 2390, 8/1963.
Research Disclosure, 12/1973, pp. 94-99.
Jonker, H., et al., PSR Eng., vol. 13, No. 2, 3-4/1969, pp. 38-44.
Goldsmith, S., Research Disclosure, 6/1976, pp. 43-44.

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