Chemical-mechanical-polishing system with continuous filtration

Abrading – Precision device or process - or with condition responsive... – Computer controlled

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451 41, 451 60, 210193, 210340, 210108, 210143, B24B 4900

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active

06165048&

ABSTRACT:
A chemical-mechanical-polishing system having a slurry distribution system, a polisher, a deionized water supply, and a drain, includes a slurry filtration system. The filtration system has two filters for alternately filtering particles in slurry and being backflushed with deionized water. Two input valves have input ports connected to the slurry distribution system and output ports respectively connected to the filters for filtering. Two output valves have input ports respectively connected to the filters for receiving filtered slurry and output ports connected to the polisher. Two backflush valves have input ports connected to the deionized water supply and output ports respectively connected to backflush with deionized water; the output ports are also respectively connected to the input ports of the two output valves. Two drain valves have input ports respectively connected to the filters for receiving backflushed fluid and output ports connected to the drain. A pressure sensor disposed to sense pressure of slurry across the filters provide pressure indications which are used by control circuitry to open and close said valves to filter slurry or backflush the filters.

REFERENCES:
patent: 4636306 (1987-01-01), Radmall
patent: 4752386 (1988-06-01), Schulz et al.
patent: 4906357 (1990-03-01), Drori
patent: 4923601 (1990-05-01), Drori
patent: 5074999 (1991-12-01), Drori
patent: 5112481 (1992-05-01), Drori
patent: 5393423 (1995-02-01), Drori
patent: 5401397 (1995-03-01), Moorehead
patent: 5516426 (1996-05-01), Hull et al.
patent: 5531798 (1996-07-01), Engstrom et al.
patent: 5664990 (1997-09-01), Adams et al.
patent: 5670038 (1997-09-01), McKinney
patent: 5690824 (1997-11-01), Stuth

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