Chemical mechanical polishing slurry

Details Chemical mechanical polishing slurry Chemical mechanical polishing slurry

2005-12-20

2005-12-20

McDonald, Shantese L. (Department: 3723)

Abrading

Abrading process

C451S036000, C451S041000, C451S060000, C451S285000, C451S286000, C451S287000, C451S446000

Reexamination Certificate

active

06976904

ABSTRACT:
A liquid suspension for planarizing an outer surface of a material comprises a liquid suspension medium of a specific liquid density; and a plurality of solid, contact-sensitive abrasive particles of a constant solid density and suspended in the liquid suspension medium. The liquid and solid densities are approximately the same so that the abrasive particles freely and stably suspend in the liquid suspension medium, without gravitational separation by settling down or floating up. In this way, damaging contacts of the solid abrasive particles with one another are minimized.

REFERENCES:
patent: 2163407 (1939-06-01), Pulfrich
patent: 2570248 (1951-10-01), Kelley
patent: 2667432 (1954-02-01), Nolte
patent: 2708787 (1955-05-01), Chick et al.
patent: 3215555 (1965-11-01), Krey
patent: 3281309 (1966-10-01), Ross
patent: 3428845 (1969-02-01), Rigden et al.
patent: 3448319 (1969-06-01), Louden
patent: 3452310 (1969-06-01), Israelson
patent: 3574579 (1971-04-01), Clarke
patent: 3576221 (1971-04-01), Hasiba
patent: 3650714 (1972-03-01), Farkas
patent: 3740822 (1973-06-01), Singleton
patent: 3753758 (1973-08-01), Shanley
patent: 3777220 (1973-12-01), Tstusko et al.
patent: 3901772 (1975-08-01), Guillotin et al.
patent: 3915369 (1975-10-01), Schnidt-Bruecken et al.
patent: 3949263 (1976-04-01), Harper
patent: 4009027 (1977-02-01), Naidich et al.
patent: 4018576 (1977-04-01), Lowder et al.
patent: 4075364 (1978-02-01), Panzera
patent: 4109031 (1978-08-01), Marscher
patent: 4111572 (1978-09-01), Noone et al.
patent: 4239502 (1980-12-01), Slack et al.
patent: 4252856 (1981-02-01), Sara
patent: 4294009 (1981-10-01), Quintin et al.
patent: 4338380 (1982-07-01), Erickson et al.
patent: 4347089 (1982-08-01), Loehman
patent: 4348131 (1982-09-01), Shimanuki et al.
patent: 4372037 (1983-02-01), Scapple et al.
patent: 4396677 (1983-08-01), Intrater et al.
patent: 4404262 (1983-09-01), Watmough
patent: 4529836 (1985-07-01), Powers et al.
patent: 4529857 (1985-07-01), Meek et al.
patent: 4556389 (1985-12-01), Ueno et al.
patent: 4593851 (1986-06-01), Skog
patent: 4608226 (1986-08-01), Lauvinerie et al.
patent: 4624403 (1986-11-01), Kohno et al.
patent: 4703884 (1987-11-01), Landingham et al.
patent: 4732780 (1988-03-01), Mitoff et al.
patent: 4735866 (1988-04-01), Moorhead
patent: 4750914 (1988-06-01), Chikaoka et al.
patent: 4776862 (1988-10-01), Wiand
patent: 4851615 (1989-07-01), Butt
patent: 4890783 (1990-01-01), Li
patent: 4899922 (1990-02-01), Slutz et al.
patent: 4924033 (1990-05-01), Iyogi et al.
patent: 4953499 (1990-09-01), Anthony et al.
patent: 4958592 (1990-09-01), Anthony et al.
patent: 4968326 (1990-11-01), Wiand
patent: 4970986 (1990-11-01), Anthony et al.
patent: 5022801 (1991-06-01), Anthony et al.
patent: 5110579 (1992-05-01), Anthony et al.
patent: 5116787 (1992-05-01), Dumbaugh, Jr.
patent: 5125557 (1992-06-01), Tanaka et al.
patent: 5143523 (1992-09-01), Matarrese
patent: 5161728 (1992-11-01), Li
patent: 5190823 (1993-03-01), Anthony et al.
patent: 5230924 (1993-07-01), Li
patent: 5248079 (1993-09-01), Li
patent: 5273731 (1993-12-01), Anthony et al.
patent: 5349922 (1994-09-01), Anthony et al.
patent: 5377522 (1995-01-01), Anthony et al.
patent: 5392982 (1995-02-01), Li
patent: 5419276 (1995-05-01), Anthony et al.
patent: 5419798 (1995-05-01), Anthony et al.
patent: 5424096 (1995-06-01), Anthony et al.
patent: 5451430 (1995-09-01), Anthony et al.
patent: 5464665 (1995-11-01), Anthony et al.
patent: 5481795 (1996-01-01), Hatakeyama et al.
patent: 5551277 (1996-09-01), Anthony et al.
patent: 5573607 (1996-11-01), Weaver
patent: 5573985 (1996-11-01), Weaver
patent: 5582540 (1996-12-01), Su et al.
patent: 5755614 (1998-05-01), Adams et al.
patent: 5874175 (1999-02-01), Li
patent: 5932348 (1999-08-01), Li
patent: 5937514 (1999-08-01), Li
patent: 6286206 (2001-09-01), Li
patent: 6384342 (2002-05-01), Li
patent: 6413589 (2002-07-01), Li
patent: 6458017 (2002-10-01), Li et al.
patent: 6676492 (2004-01-01), Li
Appl. No. 09/361,209, Li et al, filed Jul. 27, 1999
Appl. No. 09/461,405, Li et al, filed Dec. 13, 1999.
U.S. Appl. No. 09/361,209, filed Jul. 27, 1999, Li et al.
U.S. Appl. No. 09/461,405, filed Dec. 15, 1999, Li et al.

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