Chemical mechanical polishing slurry

Abrading – Machine – Tumbling device

Reexamination Certificate

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Details

C451S036000, C451S041000, C051S297000, C051S309000

Reexamination Certificate

active

06893333

ABSTRACT:
A chemical mechanical polishing slurry includes liquid and abrasive solid components, with at least some of the abrasive solid component comprising individually non-homogeneous abrasive particles. In one implementation, the non-homogeneous abrasive particles comprise an innermost portion and an outermost portion, with the innermost and outermost portions comprising different materials. In one implementation, the material of the outermost portion is harder than the material of the innermost portion. In one implementation, the material of the outermost portion comprises TiN and the material of the innermost portion comprises SiO2. In one implementation, the material of the outermost portion comprises WN and the material of the innermost portion comprises TiN. In one implementation, the material of the outermost portion is softer than the material of the innermost portion.

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