Chemical-mechanical polishing slurry

Details Chemical-mechanical polishing slurry Chemical-mechanical polishing slurry

1998-12-01

2000-06-20

Koslow, C. Melissa

Compositions: coating or plastic

Coating or plastic compositions

Polishes

216 89, 438692, 438693, 252 791, 51308, H01L 21461

Patent

active

060773375

ABSTRACT:
One embodiment of the present invention includes a chemical-mechanical polishing (CMP) slurry. The slurry is comprised of one or more ferrocenium salts that is or are reduced, during use, to ferrocene. The slurry also includes an abrasive and a concentration of hydronium ions effective to impart a pH of less than 7.

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