Chemical mechanical polishing pad with grooves alternating...

Abrading – Abrading process – With tool treating or forming

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C451S285000, C451S288000, C451S527000

Reexamination Certificate

active

06951510

ABSTRACT:
A chemical mechanical polishing (CMP) pad is provided. The CMP pad includes a groove pattern disposed on a polishing surface of the pad. The groove pattern is formed of an alternating sequence of spaced apart grooves. The alternating sequence of grooves comprises a groove of a first size and a groove of a second size, wherein the first and second groove sizes are different relative to one another.

REFERENCES:
patent: 5795218 (1998-08-01), Doan et al.
patent: 5882251 (1999-03-01), Berman et al.
patent: 5984769 (1999-11-01), Bennett et al.
patent: 6099394 (2000-08-01), James et al.
patent: 6241596 (2001-06-01), Osterheld et al.
patent: 6273806 (2001-08-01), Bennett et al.
patent: 6340325 (2002-01-01), Chen et al.
patent: 6520847 (2003-02-01), Osterheld et al.
patent: 6634936 (2003-10-01), Jensen et al.
patent: 6648734 (2003-11-01), Chin et al.
patent: 6648743 (2003-11-01), Burke
patent: 6659846 (2003-12-01), Misra et al.
patent: 6685548 (2004-02-01), Chen et al.
patent: 6783436 (2004-08-01), Muldowney
patent: 2001/0044263 (2001-11-01), Andideh et al.
patent: 2003/0092363 (2003-05-01), Laursen et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Chemical mechanical polishing pad with grooves alternating... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical mechanical polishing pad with grooves alternating..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical mechanical polishing pad with grooves alternating... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3483680

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.