Chemical mechanical polishing pad dresser

Details Chemical mechanical polishing pad dresser Chemical mechanical polishing pad dresser

2007-08-21

2007-08-21

Marcheschi, Michael (Department: 1755)

Abrasive tool making process, material, or composition

With inorganic material

C051S309000, C051S293000, C051S295000, C051S298000, C451S539000, C451S444000, C451S443000, C451S526000

Reexamination Certificate

active

11026544

ABSTRACT:
CMP pad dressers and their methods of manufacture are disclosed. One aspect of the present invention provides a CMP pad dresser having improved superabrasive grit retention in a resin layer. The CMP pad includes a resin layer, superabrasive grit held in the resin layer such that an exposed portion of each superabrasive grit protrudes from the resin layer, and a metal coating layer disposed between each superabrasive grit and the resin layer, where the exposed portions are substantially free of the metal coating layer. The metal coating layer acts to increase the retention of the superabrasive grit in the resin layer as compared to superabrasive grit absent the metal coating layer.

REFERENCES:
patent: 1941962 (1934-01-01), Tone
patent: 2876086 (1959-03-01), Raymond
patent: 3991527 (1976-11-01), Maran
patent: 4317660 (1982-03-01), Kramis et al.
patent: 5620489 (1997-04-01), Tselesin
patent: 6478831 (2002-11-01), Tselesin
patent: 6582487 (2003-06-01), Larson et al.
patent: 6752700 (2004-06-01), Duescher
patent: 6755720 (2004-06-01), Ishizaki et al.

Affiliated with

Also associated with

Rating

Chemical mechanical polishing pad dresser does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical mechanical polishing pad dresser, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical mechanical polishing pad dresser will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3869359