Chemical mechanical polishing pad conditioner

Details Chemical mechanical polishing pad conditioner Chemical mechanical polishing pad conditioner

1997-06-27

1999-03-23

Rose, Robert A.

Abrading

Abrading process

With tool treating or forming

451443, B24B 5300

Patent

active

058851372

ABSTRACT:
A polishing pad conditioner and a method for conditioning a polishing pad of a chemical/mechanical polishing system. The polishing pad conditioner includes a body defining an upper surface and a lower surface; at least one conditioning element mounted at the lower surface of the body, the conditioning element including a conditioning surface and an opening adjacent the conditioning surface; and a vacuum source operatively connected to the opening in the conditioning element. The method for conditioning a polishing pad includes the steps of holding a polishing pad conditioner including a conditioning element, a conditioning surface thereon and an opening in the conditioning element adjacent the conditioning surface in contact with a surface of the polishing pad; applying a vacuum source to the pad, the vacuum source being operatively connected to the conditioning element; and conditioning the surface of the polishing pad while simultaneously vacuuming particles therefrom.

REFERENCES:
patent: 1212628 (1917-01-01), Gowlland
patent: 5230184 (1993-07-01), Bukhman
patent: 5683289 (1997-11-01), Hempel, Jr.

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