Abrading – Flexible-member tool – per se – Interrupted or composite work face
Reexamination Certificate
2007-08-15
2008-12-02
Nguyen, Dung Van (Department: 3723)
Abrading
Flexible-member tool, per se
Interrupted or composite work face
C451S532000, C451S041000
Reexamination Certificate
active
07458885
ABSTRACT:
Shape memory chemical mechanical polishing pads are provided, wherein the shape memory chemical mechanical polishing pads comprise a polishing layer in a densified state. Also provided are methods of making the shape memory chemical mechanical polishing pads and for using them to polish substrates.
REFERENCES:
patent: 5032622 (1991-07-01), Herrington et al.
patent: 5049591 (1991-09-01), Hayashi et al.
patent: 5736463 (1998-04-01), Sato
patent: 5759090 (1998-06-01), Kawate et al.
patent: 6090479 (2000-07-01), Shirato et al.
patent: 6160084 (2000-12-01), Langer et al.
patent: 6388043 (2002-05-01), Langer et al.
patent: 6453502 (2002-09-01), Bishop
patent: 6532720 (2003-03-01), Anderson
patent: 6583194 (2003-06-01), Sendijarevic
patent: 6592995 (2003-07-01), Topolkaraev et al.
patent: 6817441 (2004-11-01), Murakami et al.
patent: 2004/0164499 (2004-08-01), Murakami et al.
patent: 2004/0235392 (2004-11-01), Ohia
Deibert Thomas S.
Nguyen Dung Van
Rohm and Haas Electronic Materials CMP Holdings Inc.
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