Chemical mechanical polishing pad

Details Chemical mechanical polishing pad Chemical mechanical polishing pad

2007-01-30

2011-11-08

Mullis, Jeffrey (Department: 1765)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

C525S088000, C525S091000, C525S187000, C051S298000, C451S526000

Reexamination Certificate

active

08053521

ABSTRACT:
The present invention relates to polishing pads, including at least 60 to 99 parts by weight of a polymer matrix (A) having 1,2-polybutadiene; and 1 to 40 parts by weight of component (B) having a copolymer having a polyether block, where the total amount of the polishing pad is 100 parts by mass, polymer matrix (A) includes 1,2-polybutadiene in an amount of at least 60 parts by weight, relative to 100 parts by mass of the polishing pad, component (B) includes the copolymer having a polyether block in an amount of at most 40 parts by weight relative to 100 parts by mass of the polishing pad, and the polishing pads have a surface resistivity of 2.6×107to 9.9×1013Ω.

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