Chemical mechanical polishing apparatus and methods using a...

Details Chemical mechanical polishing apparatus and methods using a... Chemical mechanical polishing apparatus and methods using a...

2005-08-09

2005-08-09

Hail, III, Joseph J. (Department: 3723)

Abrading

Abrading process

Glass or stone abrading

C451S008000, C451S024000, C451S060000, C451S285000, C451S286000, C451S287000, C451S288000, C451S296000, C451S303000, C451S306000, C451S307000, C451S446000

Reexamination Certificate

active

06926589

ABSTRACT:
The present invention relates to methods and apparatus that allow for chemical mechanical polishing using a flexible pad and variable fluid flow for variable polishing.

REFERENCES:
patent: 5558568 (1996-09-01), Talieh et al.
patent: 5916012 (1999-06-01), Pant et al.
patent: 6248000 (2001-06-01), Aiyer
patent: 6302767 (2001-10-01), Tietz
patent: 6322427 (2001-11-01), Li et al.
patent: 6520833 (2003-02-01), Saldana et al.
patent: 6656030 (2003-12-01), Xu et al.

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