Chemical-mechanical polishing apparatus and method

Details Chemical-mechanical polishing apparatus and method Chemical-mechanical polishing apparatus and method

1997-06-26

2000-12-19

Eley, Timothy V.

Abrading

Abrading process

Utilizing fluent abradant

451 41, 451 56, 451 72, 451288, B24B 100

Patent

active

061621129

ABSTRACT:
A chemical-mechanical polishing apparatus for polishing a workpiece. The apparatus includes a rotatable table having a surface for holding a workpiece to be polished, a table drive mechanism for rotating the rotating table, a polishing tool rotatable around a rotation axis and being rectilinearly movable in an axial direction along the rotation axis, a polishing tool drive mechanism for rotating and rectilinearly moving the polishing tool, the polishing tool drive mechanism pressing the polishing tool against the workpiece to be polished at a predetermined pressure, a supply for supplying an abrasive material between the polishing tool and the workpiece to be polished, and a foreign substance removing device for removing a foreign substance on the surface of the table. The removing device is located rotationally downstream of the table relative to the polishing tool.

REFERENCES:
patent: 4956944 (1990-09-01), Ando et al.
patent: 5399233 (1995-03-01), Murazumi et al.

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