Chemical mat film and a photosensitive film comprising an o-naph

Details Chemical mat film and a photosensitive film comprising an o-naph Chemical mat film and a photosensitive film comprising an o-naph

1989-09-22

1993-06-29

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430192, 430193, 430531, 430533, 430950, 428323, 428409, G03C 191, G03C 195, G03F 709, G03F 7023

Patent

active

052233723

ABSTRACT:
A chemical mat film having good writability and printability is disclosed which includes a transparent film, a chemical mat layer provided on one or both sides of the transparent film and containing finely divided solid particles which provide surface roughness, and an overcoat layer formed of a polymeric material and provided over the surface of the chemical mat layer, the overcoat layer having a surface roughness which is substantially coincident with that of the chemical mat layer. The chemical mat film may be used as a substrate of a photosensitive film for supporting a photosensitive layer thereon.

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