Chemical laser pump including cryogenic and condensing means

Details Chemical laser pump including cryogenic and condensing means Chemical laser pump including cryogenic and condensing means

1980-04-11

1985-04-30

Moskowitz, Nelson

Amplifiers

Parametric amplifiers

Semiconductor type

372 59, H01S 3095, H01S 322

Patent

active

045146985

ABSTRACT:
A chemical laser including a laser pump which is relatively lightweight with no moving parts is provided. This produces a low pressure, regenerable, closed system for treating laser cavity exhaust gases to remove (i.e., pump) them from the system.
The exhaust gases which emerge from the laser cavity of the chemical laser are pumped by a combination of condensation, cryogenic adsorption, and by reaction preferably with titanium, titanium-zirconium alloys, zirconium, tantalum, etc. These exhaust gases include hydrogen, deuterium and their halides, the halogens, oxygen, CO.sub.2, nitrogen and H.sub.2 O. This obviates the requirements for heavy equipment normally employed to produce a high vacuum in the laser cavity.

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Spencer et al., "Initial Performance of a CW Chemical Laser", 1970, pp. 155-160, Opto-Electronics 2.
Hinchen et al., "cw HF Electric-Discharge Mixing Laser", pp. 386-388, App. Phys. Let., vol. 17, #9.

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