Chemical laser

Coherent light generators – Particular pumping means – Chemical

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372701, 372 58, H01S 3095

Patent

active

045532435

ABSTRACT:
There is provided a high repetition rate chemical laser comprising in combination a mixing chamber, an inlet for continuously introducing reactants into the chamber, a supersonic nozzle constituting an exit from the mixing chamber, a laser cavity located at the exit of the nozzle and a device for applying pulsed electrical discharge to the reactants in the laser cavity and a method of continuous lasing at a high repetition rate which includes premixing the desired reactants, if required with diluents or inhibitors, expanding the resulting gaseous mixture through a supersonic nozzle to a velocity greater than the combustion velocity of the mixture, and applying to the mixture a high-rate pulsed electrical discharge for initiating the chemical reaction and convecting the spent gases from the laser cavity.

REFERENCES:
patent: 3560876 (1971-02-01), Airey
patent: 3688215 (1972-08-01), Spencer et al.
patent: 3701045 (1972-10-01), Bronfin et al.
patent: 3706942 (1972-12-01), Ultree
patent: 3803512 (1974-04-01), Pettipiece
patent: 3886477 (1975-05-01), Ruby et al.
patent: 3918800 (1975-11-01), Griffin
patent: 3982208 (1976-09-01), Camac
patent: 4031484 (1977-06-01), Freiberg et al.
patent: 4188592 (1980-01-01), Buczek et al.
patent: 4206429 (1980-06-01), Pinsley
patent: 4453914 (1984-06-01), Huncei et al.
Seguin et al; "Low Voltage Gas Transport TECO.sub.2 Laser", Appl. Opt., vol. 11, No. 4, pp. 745-748, Apr. 1972.
Rosenwaks et al; "A Supersonic Multikilohertz Pulsed HF Chemical Laser", J. Appl. Phys., 54(1), Jan. 1983, p. 48.
Dudkin et al; "Gasdynamic CO Chemical Laser Using Air and Carbon Disulfide"; Soc. Tech. Phys. Lett., 6(3), Mar. 1980.

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