Compositions: coating or plastic – Coating or plastic compositions – Metal-depositing composition or substrate-sensitizing...
Patent
1987-12-28
1990-02-27
Bell, Mark L.
Compositions: coating or plastic
Coating or plastic compositions
Metal-depositing composition or substrate-sensitizing...
106900, 405266, C04B 1404, C09K 1700
Patent
active
049043048
ABSTRACT:
A chemical grout for ground injection which is prepared by incorporating from 0.1 to 4.5 parts by weight of sulfamic acid and from 0.2 to 10.0 parts by weight of a water soluble magnesium salt into 100 parts by weight of an aqueous sol having a pH of 8 to 10.5 and containing from 5 to 25% by weight of colloidal silica (as SiO.sub.2) having a particle size of 3 to 7 m.mu., and from 0.05 to 1.5% by weight of Na.sub.2 O. This injecting grout has a gelation time not longer than 300 minutes. Soft ground can be consolidated by using the grout.
REFERENCES:
James G. Vail, Soluble Silicates, vol. 1, 1952, pp. 158-159.
Ralph K. Iler, The Chemistry of Silica, 1979, pp. 378-387 and 560-563.
Ralph K. Iler, Colloid Chemistry of Silica and Silicates, 1955, pp. 181-184.
Patent Abstracts of Japan, vol. 6, No. 40 (C-94) [918], Mar. 12, 1982, JP-A-56 155 287.
Patent Abstracts of Japan, vol. 7, No. 108 (C-165) [1253], May 11, 1983, JP-A-58 29 882.
Patent Abstracts of Japan, vol. 7, No. 147 (C-173) [1292], Jun. 28, 1983, JP-A-58 59 281.
Patent Abstracts of Japan, vol. 10, No. 235 (C-366) [2291], Aug. 14, 1986, JP-A-61 69 887.
Ando Mikio
Okumura Eiji
Watanabe Yoshitane
Bell Mark L.
Green Anthony J.
Nissan Chemical Industries Ltd.
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