Chemical gas analysis during processing of chemically amplified

Details Chemical gas analysis during processing of chemically amplified Chemical gas analysis during processing of chemically amplified

1998-05-28

1999-11-23

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, 430330, G03F 900

Patent

active

059897635

ABSTRACT:
Gases evolved during photolithographic processing of chemically amplified photoresist systems are monitored to allow optimization of process parameters such as intensity and duration of applied heat or radiation. Specifically, during soft bake, evaporation of solvent gases is detected. During exposure and PEB, gases evolved during activation of the polymer resin component by the photoacid are detected. The intensity and/or duration of the heating or exposure are then varied to optimize resolution of the particular photolithography process. Residual gas analysis, diode laser spectroscopy, FT-IR spectroscopy, and electronic sensing may be utilized alone or in combination to monitor composition and/or concentration of evolved gases in accordance with the present invention.

REFERENCES:
patent: 5789124 (1998-08-01), Todd
Davidson, T., ACS Symposium Series 242 Polymers in Electronics, American Chemical Society, Washington, D.C. (1984).
Mack, C.A., "Inside PROLITH, A Comprehensive Guide to Optical Lithography Simulation", by FINLE Technologies, Inc., pp. 76-80.
"Commercial DUV Photoresist Systems", Clariant Photoresist Product Flyer (1 pg.).
"Negative DUV Photoresist Chemistry", Clariant Photoresist Product Flyer (1 pg.).
Mertesdorf, C., et al., "Structural Design of Ketal and Acetal Blocking Groups in 2-Component Chemically Amplified Positive DUV Resists", SPIE vol. 2438, pp. 84-98.

Affiliated with

Also associated with

Rating

Chemical gas analysis during processing of chemically amplified does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical gas analysis during processing of chemically amplified , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical gas analysis during processing of chemically amplified will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1219780