Chemical functionalization of material surfaces using...

Details Chemical functionalization of material surfaces using... Chemical functionalization of material surfaces using...

2006-08-22

2006-08-22

Meeks, Timothy (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Chemical deposition from liquid contiguous with substrate...

C427S515000, C427S553000, C427S558000, C427S595000, C250S492100, C250S50400H, C250S505100

Reexamination Certificate

active

07094451

ABSTRACT:
A method using irradiation with optical light in the presence of a chemical dissolved in a solvent which chemical reacts with the surface in the presence of the irradiation to modify the surface (12A,104A,202A,304A,402A,502A) of a substrate (12, 104, 202, 304, 402, 502) is described. The light can be pulsed or continuous. The method is significantly enhanced by the presence of water (14, 124, 204, 308, 410, 508) as the solvent containing the dissolved chemical on the surface. The treated surfaces are more paintable and bondable.

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